发明名称 Rack for processing photosensitive material
摘要 A rack for processing a photosensitive material includes a roller transport mechanism composed of a plurality of transport rollers for transporting the photosensitive material to dip the photosensitive material in a processing solution contained in a processing tank. The plurality of transport rollers includes two pairs of generally opposed rollers, the two pairs being disposed adjacent to each other along a path of transport of the photosensitive material. The rollers of each pair of rollers between which the photosensitive material passes is spaced from each other by a distance greater than the thickness of the photosensitive material. A shutter mechanism is provided for covering the surface of the processing solution. The shutter mechanism is disposed between the two pairs of rollers.
申请公布号 US4933699(A) 申请公布日期 1990.06.12
申请号 US19890398356 申请日期 1989.08.24
申请人 FUJI PHOTO FILM CO., LTD. 发明人 NAKAMURA, TAKASHI;MATSUOKA, HIROSHI;NORITSUKI, TETSUYA
分类号 G03D3/13 主分类号 G03D3/13
代理机构 代理人
主权项
地址