发明名称 RESIST PROCESSOR
摘要 PURPOSE:To prevent dusts from being sucked, and to improve the quantity, yield and productivity of a material to be processed by providing an ion generator for ionizing laminar flow gas in a vertical laminar flow passage. CONSTITUTION:A prefilter 17 for filtering a vertical laminar flow 14, fans 18, 18 for forcibly intaking the flow 14, a damper 19 for buffering the flow 14, and an ion generator 20 for ionizing the buffered flow 14 are sequentially disposed in this order in a rectangular cylindrical housing 16 of a temperature/ moisture controller 15. Since the flow 14 to be fed into a cup 2 can be ionized by the generator 20 provided in the controller 15, static electricity charged on a semiconductor wafer 7 can be neutralized, thereby preventing fine dusts, etc., from being sucked to the surface.
申请公布号 JPH02148827(A) 申请公布日期 1990.06.07
申请号 JP19880302712 申请日期 1988.11.30
申请人 TOKYO ELECTRON LTD;TERU KYUSHU KK 发明人 IWAZU HARUO
分类号 G03F7/16;B05C11/08;G03F7/30;H01L21/027;H01L21/30 主分类号 G03F7/16
代理机构 代理人
主权项
地址