摘要 |
The invention relates to a negative-working, radiation-sensitive mixture containing a binder and a polymer containing 1,2,3-thiadiazole groups. The binder employed is a polyfunctional compound whose functional groups react with ketene; the polymer is a compound formed by polymerisation of a compound of the formula I <IMAGE> in which R is a polymerisable group. If the polymer is a copolymer in which the comonomer is a compound containing functional groups which can react with ketene, the binder can be omitted. The negative-working, radiation-sensitive mixture described is particularly suitable for UV, electron-beam and X-ray lithography.
|
申请人 |
HOECHST AG, 6230 FRANKFURT, DE |
发明人 |
PRASS, WERNER, DIPL.-CHEM. DR.;ZERTANI, RUDOLPH, DIPL.-CHEM. DR.;LINGNAU, JUERGEN, DIPL.-CHEM. DR.;HANOLD, NORBERT, DIPL.-CHEM. DR., 6500 MAINZ, DE;MEIER, HERBERT, PROF. DIPL.-CHEM. DR., 6501 ZORNHEIM, DE |