发明名称 Structure and method for selectively producing a conductive region on a substrate
摘要 In a multi-chip module, a structure for selectively connecting two conductors. A switchable connector (36) is disposed between a first and second portion (30,32) of a copper conductor (28). The switchable connector comprises an amorphous silicon layer (58), which extends between two spacer pads (56) that are electrically connected to the first and second portions of the copper conductor. A barrier layer (60) is formed atop the amorphous silicon, physically separating it from a reactive metal layer (62). The reactive metal layer is coated with an antireflective coating (64). Interaction of the reactive metal layer with the amorphous silicon layer is prevented by the barrier layer until the barrier layer is heated above 500 DEG C. A laser beam (66) is focused on opposite edges of the switchable connector, causing the barrier layer and reactive metal layer to diffuse into the amorphous silicon, forming electrically conductive silicides. Electric current can then flow between the first and second portions of the copper conductor through the silicides and the remainder of the reactive metal layer.
申请公布号 US4931353(A) 申请公布日期 1990.06.05
申请号 US19890440766 申请日期 1989.11.22
申请人 THE BOEING COMPANY 发明人 TANIELIAN, MINAS H.
分类号 H01L21/768;H01L23/525 主分类号 H01L21/768
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