发明名称 |
Image reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment |
摘要 |
A process for converting a normally positive working photosensitive composition to a negative working composition. One forms a composition containing an alkali soluble resin, a 1,2 quinone diazide-4-sulfonyl compound and an acid catalyzed crosslinker in a solvent mixture. After drying and imagewise exposing, the composition is baked and developed to produce a negative image.
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申请公布号 |
US4931381(A) |
申请公布日期 |
1990.06.05 |
申请号 |
US19880268640 |
申请日期 |
1988.11.08 |
申请人 |
HOECHST CELANESE CORPORATION |
发明人 |
SPAK, MARK A.;MAMMATO, DONALD;DURHAM, DANA;JAIN, SANGYA |
分类号 |
G03F7/022;G03F7/38 |
主分类号 |
G03F7/022 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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