发明名称 |
Bilayer lithographic process |
摘要 |
A method for producing high resolution patterned resist images having excellent etch resistance and superior thermal and dimensional stability comprises the steps of: (a) forming a planarizing layer resistant to silicon uptake on a substrate; (b) providing a positive-working photoresist composition containing -OH or -NH- groups over the planarizing layer, (c) imagewise exposing the resist to activating radiation, (d) developing the exposed resist, (e) contacting the developed resist with a vapor comprising a silicon-containing compound to effect silylation thereof and thereby impart etch resistance, the silicon-containing compound having the structural formula: <IMAGE> wherein: X1 and X2 are individually chloro or <IMAGE> wherein R3 and R4 are individually H or alkyl; and R1 and R2 are individually H or alkyl; and (f) contacting the planarizing layer with an oxygen-containing plasma so as to preferentially remove portions thereof.
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申请公布号 |
US4931351(A) |
申请公布日期 |
1990.06.05 |
申请号 |
US19890378471 |
申请日期 |
1989.07.13 |
申请人 |
EASTMAN KODAK COMPANY |
发明人 |
MCCOLGIN, WILLIAM C.;BRUST, THOMAS B.;DALY, ROBERT C.;JECH, JR., JOSEPH;LINDHOLM, ROBERT D. |
分类号 |
G03F7/09;G03F7/40 |
主分类号 |
G03F7/09 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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