| 摘要 |
PURPOSE:To obtain a resist pattern having high image contrast and superior sectional shape and to obtain a resist soln. having high preservation stability by incorporating a specified triazine compd., specified cresol-novolak resin and an alkoxy-methylated melamine resin into a compsn. CONSTITUTION:A triazine compd. expressed by the formula I, a cresol-novolak resin obtd. from cresol contg. >=30wt.% m-cresol, and an alkoxymethylated melamine resin are incorporated into a compsn. In the formula I, Z is expressed by the formula II. In the formula II, each R<1> and R<2> is a 1-5C alkyl group; each R<3> and R<4> is an H atom, OH group, etc. Thus, an electron beam resist compsn. capable of providing a resist pattern having high image contrast and superior sectional shape, and being capable of providing a resist soln. having high preservation stability is obtd. |
