发明名称 METHOD AND DEVICE FOR POST EXPOSING OF PHOTOSENSITIVE RESIN PLATE
摘要 PURPOSE:To obtain the photosensitive resin plate which has no consistency on the surface with a simple mechanism and one operator without generating problems in hygiene, etc., by forming a water film on a plate surface in a perpendicular state and subjecting the plate to post exposing. CONSTITUTION:The photosensitive resin plate subjected to image exposing and developing is fixed perpendicularly to a plate fixing plate and water is sprayed onto the surface of the resin plate from plural pieces of water feed ports 3 provided uniformly at prescribed intervals on the plane parallel with the resin plate to form the continuous water film on the plate surface. The surface of the resin plate is substantially shut off from the oxygen in the air and the resin plate is irradiate with active rays through the water film simultaneously therewith. A series of the processes can, therefore, be treated all in the perpendicular state of the resin plate. The movability of the plate between the respective processes and the handling characteristic thereof are extremely improved in this way and the engraving is speeded up. Plate making even by one operator is possible particularly in engraving of the large-sized plate.
申请公布号 JPH02144543(A) 申请公布日期 1990.06.04
申请号 JP19880298159 申请日期 1988.11.28
申请人 ASAHI CHEM IND CO LTD 发明人 YANAGIDA MASARU;KAWATSUJI SHINICHI
分类号 G03F7/20;G03F7/40 主分类号 G03F7/20
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