METHOD FOR REPAIRING DEFECTIVE PART OF PATTERN

摘要

PURPOSE:To easily repair the defective part of a pattern by applying a photoresist of a positive type on a transparent substrate, superposing a substrate for reference having the pattern which is reverse in negative and positive from the pattern on the transparent substrate and irradiating the substrates with light from the side of the substrate for reference. CONSTITUTION:The photoresist 21 of the positive type is applied on the transparent substrate 1 and the substrate 11 for reference having the pattern PT 2 reverse in negative and positive from the pattern PT 1 is superposed on the transparent substrate 1. The substrates are irradiated with light from the side of the substrate 11 for reference to expose the photoresist 21. The substrate 11 for reference acts as a mask for selective exposing of the defective part 4 when the transparent substrate 1 and the substrate 11 for reference are superposed on each other. Even if the defective part 4 is fine or even if the defective parts 4 exist at many points, these defective parts 4 are completely and easily repaired.