发明名称 ISOLATED TRANSMISSION LINE AND MANUFACTURE THEREOF
摘要 <p>PURPOSE: To improve electric performance of a microstrip transmission line by forming one microstrip transmission line at least on a dielectric layer, removing the dielectric layer from the outside area of each line, and forming an independent line supported by the post of dielectric materials under respective lines. CONSTITUTION: A separated metal microstrip line 20 exists only at a post 22 of dielectric materials between a metal wire and a metal ground surface 24. The vertical dielectric post 22 is separated by a gap or an opening area 26 extending downward to the ground surface 24 inside a space around the metal wire 20, or the gap is fixed. Therefore, the dielectric material existing between the metal wire 20 and the ground surface 24 is either only a vertical wall having substantially the same width as the metal wire 20 or only the post 22. The area which is higher than the ground surface 24, namely, the gap 26 is filled with air of dielectric constant '1'. Thus, the composite dielectric constant or the average dielectric constant between the metal wire 20 and the ground surface 24 is reduced substantially and electric characteristics in transmission line structure 26 can be improved.</p>
申请公布号 JPH02140931(A) 申请公布日期 1990.05.30
申请号 JP19890187228 申请日期 1989.07.19
申请人 UNIV CALIFORNIA 发明人 DEIBUITSUDO BII TATSUKAAMAN
分类号 H01L21/3205;H01P3/08;H01P11/00 主分类号 H01L21/3205
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