| 摘要 |
<p>A method for the examination of electrically active impurities of semiconductor materials or semiconductor structures is disclosed. The method comprises the steps of providing a junction in a sample taken from the semiconductor to be tested, inserting the sample in a microwave field, providing a space charge layer in the junction by applying a reverse bias thereto, filling the electrically active defects of the space charge layer, and examining the thermal emission process proceeding to reach a thermal equilibrium state that occurs following the filling step by measuring the change of the microwave field that takes place due to changes in microwave absorption in the sample during the thermal emission process. The microwave field should be present at least during the examination of the transient microwave absorption. A measuring arrangement for carrying out the method is also disclosed in which a sample of the semiconductor comprises a junction, the sample is provided with a pair of electrical contacts, and the measuring arrangement comprises a biasing means coupled to the contacts for reverse biasing the junction to provide a space charge layer therein, a means for filling the electrically active defects in the layer during a predetermined period or periods, and transient detecting means for detecting transient changes in the junction after termination of said periods. The arrangement further comprises a microwave generator, and microwave means coupled to the generator which defines a microwave field. The sample is arranged in the field of the microwave means with a contact coupled to ground. The transient detecting means is a microwave detector arranged to detect transient changes in microwave absorption due to the changes in the junction.</p> |
