| 摘要 |
PURPOSE:To expose only the lower thin part of a film made of an optical color-fading-away material with a flat surface and to form a fine pattern by forming a resist layer possessing an irregular pattern on the surface and placing the optical color-fading-away material thereon. CONSTITUTION:The resist layer 2 is formed on a substrate 1, and is exposed through a mask of dimension smaller than the resolution limit of an exposing device to develop and remove an exposure part 2b. After the optical color- fading-away material film 3 is formed on the entire substrate, exposing conditions are adjusted to execute overall exposure. The color-fading-away layer 3b is formed, and the layer 3a whose color does not fade away is left on the recessed part of the resist layer 2c. By using the layer 3a as a mark, the layer 2c is exposed, and the lower layer 2c of the layer 3b other than the layer 3a is selectively exposed to form a photosensitive part 2d. Consecutively, the layers 3a and 3b are removed to develop the photosensitive part 2d, and a resist pattern 2e is obtained. |
