发明名称 SEMICONDUCTOR STORAGE DEVICE
摘要 PURPOSE:To enhance an integration density by a structure wherein a potential of a word line is transmitted to an element region without an intermediary of a transfer gate electrode in order to eliminate a need to form the transfer gate electrode having a complicated and fine pattern. CONSTITUTION:When a potential of word lines 8' is transmitted to element regions 1, the potential of the word lines 8' is transmitted directly to the element regions 1 without an intermediary of a transfer gate electrode. Accordingly, since the transfer gate electrode having a complicated and fine pattern is not formed, this is advantageous in order to enhance an integration density. In addition, since a process to make contact holes 5' used to connect the word lines 8' to the transfer gate electrode is eliminated, a process is simplified; this is also advantageous in order to enhance the integration density and to lower a cost; in addition, a contact resistance at the word lines can be reduced; a high-speed operation can be realized. Thereby, a bottleneck at enhancing the integration density can be improved; the integration density can be further enhanced.
申请公布号 JPH02137364(A) 申请公布日期 1990.05.25
申请号 JP19880291958 申请日期 1988.11.18
申请人 TOSHIBA CORP 发明人 KUMAGAI JUNPEI;FUJII HIDETAKE
分类号 G11C11/401;H01L21/8242;H01L27/10;H01L27/108 主分类号 G11C11/401
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