DEVICE FOR CLEANING OF SEMICONDUCTOR WAFER,申请号JP19880291709-传众专利搜索

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发明名称	DEVICE FOR CLEANING OF SEMICONDUCTOR WAFER
摘要
申请公布号	JPH02137321(A)	申请公布日期	1990.05.25
申请号	JP19880291709	申请日期	1988.11.18
申请人	NEC CORP	发明人	MURAI ASAKO
分类号	B08B3/12;H01L21/304	主分类号	B08B3/12
代理机构		代理人
主权项
地址

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