| 摘要 |
PURPOSE:To expose a main pattern and a positioning mark at the same time by forming auxiliary light shield films on the prolongations of a scribe line area facing one mark provided outside a cover and two directly adjacent scribe line areas. CONSTITUTION:A main pattern area 1 is formed and the scribe line area 2 is arranged around the area 1; and the reticle cover 3 is formed around the scribe area 2 while a light shield metal layer of chromium, etc., is left. At least one positioning mark 5 is formed outside the cover and the auxiliary light shield films 6 are formed on the prolongations of the scribe line area 2 facing the mask 5 and two directly adjacent scribe line areas 2 while the light shield metal layer is left. An auxiliary pattern 4 is formed on one side of the scribe line area 2 and a light shield area is formed in the remaining scribe line area 2 while the light shield metal layer is left. Consequently, the auxiliary pattern formed in the scribe line area is not broken owing to double exposure, and the main pattern and positioning mark can be exposed at the same time. |
