发明名称 PHOTOMASK
摘要 PURPOSE:To easily make a up-down or right-left decision by providing a recessed part or projection part for the criterion of the vertical or horizontal directions of a pattern outside the pattern formation area of a circular substrate. CONSTITUTION:A recessed part 5 is formed in the reverse surface of the circular substrate 1 and when the tip of a limit switch 6 falls in the recessed part 5 by rotating the circular substrate 1 that the tip of the limit switch 6 contacts, the limit switch 6 is turned on. Further, a recessed part 5 is formed in the top surface of the circular disk 1 and when a light beam 71 enters the recessed part 5 by the rotation of the circular substrate 1, the light beam which is incident on a light receiving element 72 so far is not incident on the light receiving element 72 any more. Thus, the recessed parts for the criterion of the vertical or horizontal direction is provided outside the pattern formation area of the circular substrate previously, so rough positioning is automated and misrecognition is eliminated to easily make the up-down or right-left decision.
申请公布号 JPH02135344(A) 申请公布日期 1990.05.24
申请号 JP19880289212 申请日期 1988.11.16
申请人 FUJITSU LTD 发明人 MATSUI SHOGO;KOBAYASHI KENICHI
分类号 G03F1/60;G03F7/20;H01L21/027 主分类号 G03F1/60
代理机构 代理人
主权项
地址