| 摘要 |
PURPOSE:To enable accurate temperature setting of a stage and its periphery in a short time by providing an infrared ray sensor to measure a temperature of a sample within a vacuum chamber. CONSTITUTION:In a pattern exposure device to generate a pattern by irradiating a charged beam 2 consisting of ion or electron to a sample 3 which is held inside a vacuum chamber 4, an infrared ray sensor 6 to measure a temperature of the sample 3 is provided inside the vacuum chamber 4. For example, the infrared ray sensor 6 for temperature measurement is provided to an upper part inside the vacuum chamber 4, a photo mask substrate 3 moves from a movable stage 5 to a lower part thereof, and measurement results are displayed on a display 7 to allow the confirmation of temperature distribution. As for the infrared ray sensor 6, an area array sensor, etc., consisting of HgDdTe is used. |
