发明名称 |
Process for fabricating bipolar and CMOS transistors on a common substrate. |
摘要 |
An intercontact dielectric layer includes an underlying layer of undoped silicon dicxide overlaid by a relatively thicker layer of boron- and phosphorus-doped silicon dioxide. The difference in etching rates between the doped and undoped layers allows the use of both wet and dry etches to form contact openings having improved cross-sectional profiles to enhance step coverage of subsequently formed layers. |
申请公布号 |
EP0369336(A2) |
申请公布日期 |
1990.05.23 |
申请号 |
EP19890120847 |
申请日期 |
1989.11.10 |
申请人 |
NATIONAL SEMICONDUCTOR CORPORATION |
发明人 |
BASTANI, BAMI;LAGE, CRAIG;WONG, LARRY |
分类号 |
H01L29/73;H01L21/331;H01L21/768;H01L21/8249;H01L23/532;H01L27/06;H01L29/732 |
主分类号 |
H01L29/73 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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