发明名称 |
SELECTIVE POLISHING METHOD |
摘要 |
A selective polishing method comprises polishing the surface of a body to be polished having a region comprising Si3N4 and a region comprising a material more easily workable than said Si3N4 provided with a difference in height with the surface of the region comprising said more easily workable material being made higher with an abrasive comprising colloidal silica or an abrasive comprising colloidal silica as the solute and water as the solvent. |
申请公布号 |
EP0363100(A3) |
申请公布日期 |
1990.05.23 |
申请号 |
EP19890309978 |
申请日期 |
1989.09.29 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
YANEHARA, TAKAO |
分类号 |
B24B1/00;B24B37/00;B24B37/10;C09K3/14;H01L21/304;H01L21/306;H01L21/3213;H01L21/762 |
主分类号 |
B24B1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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