| 摘要 |
<p>PURPOSE:To prevent a wafer from being contaminated and to improve a yield of product by a method wherein the title device is provided with an exhaust system which forcedly discharge dust generated in a holding mechanism to the exterior of a clean room. CONSTITUTION:When a switch of a wafer transfer device 11 is turned-ON, fans 19, 20 and 24 are rotated, dust generated in the device 11 by rotating air currents generated by a multitude of the fans 24 is prevented from being scattered in a clean room and is sucked in a grating floor 10 by suction. Moreover, dust generated in a holding mechanism 13 is made to pass through a passage 41 of a contrarotating axis 40 by a rotating air current generated by the fan 19 to enter the interior of a coupling member 12 through holes 42 and moreover, is made to enter the interior of the main body of the device 11 from the member 12 by a rotating air current generated by the fan 20 and is discharged in the floor 10 by the fans 24. Thereby, the dust generated in the mechanism 13 is forcedly discharged to the exterior of the clean room to prevent a wafer from being contaminated and a yield of product can be improved.</p> |
