Vertical substrate orientation for gas-atomizing spray-deposition apparatus

摘要

A molten metal gas-atomizing spray-depositing apparatus has an atomizer employing a pressurized gas flow for atomizing a stream of molten metal into a divergent spray pattern of metal particles and producing a flow of the particles in the pattern thereof along with the gas flow in a generally downward direction. The apparatus also includes a substrate movable continuously along an endless path and having an area thereon disposed below the atomizer for receiving a deposit of the particles in the spray pattern to form a product on the substrate being substantially uniform in thickness. The endless path of the substrate is generally elongated in the downward direction and thus extends parallel to the general downward direction of gas flow such that any particle overspray past the deposit-receiving area is carried by the gas flow downward past the substrate, substantially avoiding entrainment of the particle overspray in the product being formed on the substrate. The spray pattern has a central vertical axis and the substrate has a pair of parallel runs which extend generally parallel to the vertical axis of the spray pattern.