| 摘要 |
PURPOSE:To produce a good-quality deposited film having almost uniform thickness and quality with good reproducibility by specifying the ratio of the diameter of the cross section of a reaction space to the diameter of the cross section of a reaction vessel. CONSTITUTION:The ratio of the diameter of the cross section of the reaction vessel 101 for forming a deposited film to the diameter of the cross section of the reaction space surrounded by the plural substrate 105 for forming a deposited film is controlled to >=10, and a deposited film is formed in the large vessel 101. As a result, the gas in the reaction space flows in the concentric direction, and a good-quality deposited film having the same thickness and quality is formed on the plural substrate 105 with good reproducibility. |
