| 摘要 |
PURPOSE:To improve the dimension accuracy of the electron beam passing hole area of a shadow mask and uniformalize the thickness of a darkened film by executing the heat treatment process, in a prescribed transfer speed, in which annealing and the darkening process are carried-out at a same time in the environment containing steam or CO2 gas. CONSTITUTION:The loading and unloading, electrolytic degreasing, water washing and weak acid treatment, water-washing, drying etc. which were necessary in the conventional, Ni-plating process for a shadow mask material can be avoided perfectly, and further variation of the dimension of an electron beam passing hole area is avoided, and finally the quality of a shadow mask and the yield can be improved, by continuously executing the Ni-plating process and the heating process in succession to the etching process and the resist-film removing process for the shadow mask material. Further, loading and unloading and heaping of flat masks which were required in the conventional darkening and annealing processes can be avoided, and since the flat masks to be put in a furnace are not heaped, the uneveness of thickness of a darkened film can be reduced markedly. |
