| 摘要 |
PURPOSE:To carry out high spatial resolution by detecting a mask pattern image and collating this pattern image with a reference standard pattern image and detecting the flaw of the mask to be detected. CONSTITUTION:X-rays emitted from an X-ray source 201 are passed through a converging optical element 202 and a fine X-ray spot is formed on the pattern of a mask 203 to be detected. X-rays passed through the mask 203 are detected with a detector 206 and converted into a digital signal with a detector circuit 207 and an X-ray mask detection picture image is obtained. On the other hand, the X-ray mask design data sent from a CAD system are converted into a format and thereafter this format is stored in a hard disk 302. The data for electron beam plotting stored in the disk 302 are converted into the dot pattern data with a dot conversion circuit 303. The intensity distribution of the fine spot is superposed with a reference data conversion circuit 304 and the reference data are obtained. This reference data are compared with the X-ray mask measurement data with a data comparison circuit 306 to perform decision of a flaw. |
