发明名称 PHTHALIMIDE COMPOUNDS FOR FORMING AMORPHOUS LAYERS BY VACUUM DEPOSITION
摘要 PHTHALIMIDE COMPOUNDS FOR FORMING AMORPHOUS LAYERS BY VACUUM DEPOSITION There are disclosed phthalimide compounds of the structure: wherein R and R1 are independently selected from the group consisting of nitro, foramido groups, carbamoyl groups and heterocyclic groups derived from amino or carboxyl groups.
申请公布号 CA2002865(A1) 申请公布日期 1990.05.21
申请号 CA19892002865 申请日期 1989.11.14
申请人 EASTMAN KODAK CO 发明人 MACHIELE, DELWYN E;BRAZAS, JOHN C JR
分类号 C07D209/48;(IPC1-7):C07D209/48;C07D401/12;C07D405/12 主分类号 C07D209/48
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