发明名称 |
PHTHALIMIDE COMPOUNDS FOR FORMING AMORPHOUS LAYERS BY VACUUM DEPOSITION |
摘要 |
PHTHALIMIDE COMPOUNDS FOR FORMING AMORPHOUS LAYERS BY VACUUM DEPOSITION There are disclosed phthalimide compounds of the structure: wherein R and R1 are independently selected from the group consisting of nitro, foramido groups, carbamoyl groups and heterocyclic groups derived from amino or carboxyl groups.
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申请公布号 |
CA2002865(A1) |
申请公布日期 |
1990.05.21 |
申请号 |
CA19892002865 |
申请日期 |
1989.11.14 |
申请人 |
EASTMAN KODAK CO |
发明人 |
MACHIELE, DELWYN E;BRAZAS, JOHN C JR |
分类号 |
C07D209/48;(IPC1-7):C07D209/48;C07D401/12;C07D405/12 |
主分类号 |
C07D209/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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