发明名称 MICROCHAMBER PLATE, PARTICLE DISCRIMINATION, PARTICLE TREATING DEVICE AND CELL TREATING DEVICE
摘要 <p>PURPOSE:To automatically carry out a large amount of cell fusion by equipping plural partition chambers having a pair of electrode in the interior and a means of impressing electric voltage between the electrodes independently in each chamber. CONSTITUTION:A silicon wafer, etc., is subjected to anisotropic etching treatment and provided with lattice partition chambers 101-103 and 201-203 and each partition chamber is provided with a pair of electrodes 802 and 803 to give a microchamber plate 901. Electrical voltage is impressed between the electrodes and a pair of cells existing between the electrodes are mutually contacted and fused. Change in shape of fused cell is known from change in potential between the electrodes and pulse voltage of fusion is strengthened or weakened and controlled. Since an electric fusion condition depending upon change in individual of cells existing in each partition chamber can be finely controlled, a great number of cells can be efficiently fused.</p>
申请公布号 JPH02131569(A) 申请公布日期 1990.05.21
申请号 JP19880283601 申请日期 1988.11.11
申请人 HITACHI LTD 发明人 KAWAMURA YOSHIO;TANAKA SHINJI;SATO KAZUO;KOHITA HIROYUKI
分类号 G01N33/48;C12M1/00;C12N5/10;C12N13/00;C12N15/02;C40B60/14 主分类号 G01N33/48
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