发明名称 DIRECT LITHOGRAPHY DEVICE FOR USE IN THICK FILM CIRCUIT FORMATION
摘要 PURPOSE:To limit the exhaust of a solvent to the minimum by a method wherein a closed air tank is provided between a solenoid valve and 8 nozzle end the inflow of the air is allowed by a freely expansible and contractible member in the tank at the time only of evacuation. CONSTITUTION:At the time of lithography, a solenoid valve 16 is operated to send high-pressure air from a source 18 to an expansion and contraction member 24 in a tank main body 20 and the member 24 is stretched in the direction shown by an arrow 28. The air in a chamber 22 pushes out a paste in a syringe 12 through a nozzle. At the time of nonlithography, the inflow of the high-pressure air is stopped and the high-pressure air in the member 24 is exhaused in the air through a silencer 26. The member 24 shrinks in the direction reverse to the direction shown by the arrow 28 by its elastic action. The volume of the air chamber 22 is enlarged and the pressing force of the air in the syringe 12 is decreased. A solvent in the paste in the syringe 12 flows in the chamber 22, but as the chamber 22 is hermetic, the solvent is saturated in the spaces in the syringe 12 and the chamber 22 and does not volatilize any more. Accordingly, no change is generated in the viscosity of the solvent and an adjustment of a discharge pressure becomes unnecessary.
申请公布号 JPH02130994(A) 申请公布日期 1990.05.18
申请号 JP19880285459 申请日期 1988.11.11
申请人 JUKI CORP 发明人 TAGUCHI KATSUHIKO
分类号 B43L13/00;H05K3/10;H05K3/12 主分类号 B43L13/00
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