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发明名称
HEAT TREATMENT EQUIPMENT OF SEMICONDUCTOR SUBSTRATE
摘要
申请公布号
JPH02128420(A)
申请公布日期
1990.05.16
申请号
JP19880282718
申请日期
1988.11.08
申请人
NEC CORP
发明人
TANAKA TAKAO
分类号
H01L21/22
主分类号
H01L21/22
代理机构
代理人
主权项
地址
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