发明名称 METHOD AND DEVICE FOR APPLYING SERUM IN ELECTROPHORETIC DEVICE
摘要 PURPOSE:To allow the arbitrary varying and adjusting of a serum applying position so as to meet a film-like support by positioning the support to a receiving base for applying, then positioning an applying device and applying the serum on the support by the vertical movement of the applying device. CONSTITUTION:The support T on a transporting base 100 is stopped when its position is detected by a position detector 49. A film correcting mechanism 30 is lifted by a prescribed distance by a feed screw shaft 22 by which the support T is transferred onto a film correcting plate 320. The correcting plate 320 moves near to or apart from the support T to correct the bend and positional deviation of the support T. The correcting plate 320 is then lifted and the receiving base 521 for applying is moved to the serum applying position and is then lowered to lay the support T on the base 521. The applying device 532 samples the specimen serum with a chip 532A and is then positioned above the serum applying position of the support T. The serum is applied on the support T by vertically moving the chip 532A. The serum applying position is varied and adjusted as desired to meet the support in this way and the positional deviation and bending are thereby automatically corrected.
申请公布号 JPH02126151(A) 申请公布日期 1990.05.15
申请号 JP19880278947 申请日期 1988.11.04
申请人 JOKO:KK 发明人 UEKI TETSURO;KOBAYASHI TSUTOMU
分类号 G01N27/447 主分类号 G01N27/447
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