发明名称 |
APPARATUS FOR TREATING WASTE LIQUID |
摘要 |
PURPOSE:To execute treatment of waste liquid almost receiving effect of circumferential temp. by covering a waste liquid vessel and a cylindrical body with a radiating cover composed of material with high emissivity to an infrared rays or an far infrared rays. CONSTITUTION:Guide walls 9 forming plural chambers 8 extending to vertical direction and opening the upper end are arranged in the waste liquid vessel 2 opening the upper end. Then, the radiating cover 27 composed of the material with high emissivity to the infrared rays or the far infrared rays is applied to a cylindrical body 3 integratedly fitted to the vessel 2 so as to cover the outer surface thereof. Further, catalyst 15 for oxidizing the vapor of the waste liquid and arranged at upper part of the vessel 2 is fitted to the cylindrical body 13. Then, an ignition means 18 for igniting the vapor of the waste liquid at near the catalyst 15 and a heating means 6 for generating the vapor by heating the waste liquid in the vessel 2 and stopping heating after igniting the generated vapor with the ignition means 18. Further, each chamber 8 is mutually communicated so that the waste liquid supplied into the vessel 2 is gradually supplied to each chamber 8. |
申请公布号 |
JPH02126987(A) |
申请公布日期 |
1990.05.15 |
申请号 |
JP19880279148 |
申请日期 |
1988.11.02 |
申请人 |
HAKUKIN WARMERS CO LTD;FUJI PHOTO FILM CO LTD |
发明人 |
SEKIDO MASAYASU;YODA AKIRA |
分类号 |
G03G21/00;B01D53/86;C02F1/04 |
主分类号 |
G03G21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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