发明名称 APPARATUS FOR TREATING WASTE LIQUID
摘要 PURPOSE:To execute treatment of waste liquid almost receiving effect of circumferential temp. by covering a waste liquid vessel and a cylindrical body with a radiating cover composed of material with high emissivity to an infrared rays or an far infrared rays. CONSTITUTION:Guide walls 9 forming plural chambers 8 extending to vertical direction and opening the upper end are arranged in the waste liquid vessel 2 opening the upper end. Then, the radiating cover 27 composed of the material with high emissivity to the infrared rays or the far infrared rays is applied to a cylindrical body 3 integratedly fitted to the vessel 2 so as to cover the outer surface thereof. Further, catalyst 15 for oxidizing the vapor of the waste liquid and arranged at upper part of the vessel 2 is fitted to the cylindrical body 13. Then, an ignition means 18 for igniting the vapor of the waste liquid at near the catalyst 15 and a heating means 6 for generating the vapor by heating the waste liquid in the vessel 2 and stopping heating after igniting the generated vapor with the ignition means 18. Further, each chamber 8 is mutually communicated so that the waste liquid supplied into the vessel 2 is gradually supplied to each chamber 8.
申请公布号 JPH02126987(A) 申请公布日期 1990.05.15
申请号 JP19880279148 申请日期 1988.11.02
申请人 HAKUKIN WARMERS CO LTD;FUJI PHOTO FILM CO LTD 发明人 SEKIDO MASAYASU;YODA AKIRA
分类号 G03G21/00;B01D53/86;C02F1/04 主分类号 G03G21/00
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