| 摘要 |
NEW MATERIAL:The compound of formula (dotted line is single or double bond; X is 0 or H2; R1-R9 are H, OH, methoxy, ethoxy, methylthio, carboxylic acid group or halogen; R1 and R2, R2 and R3, R3 and R4, R5 and R6, R6 and R7, R7 and R8 or R8 and R9 may together form methylenedioxy). USE:An antioxidant. PREPARATION:A microbial strain belonging to genus Streptomyces and capable of producing the compound of formula [e.g., Streptomyces sp. OH-1049 (FERM P-9858)] is cultured at 24-30 deg.C for 1-8hr preferably by submerged aeration and agitation culture process. |
