发明名称 |
Process for the chemical vapor deposition of aluminum |
摘要 |
A method for forming aluminum films is provided comprising employing the techniques of chemical vapor deposition to thermally decompose a vapor comprising a aluminum hydride subsequent to the treatment of the substrate with a Group IVB or VB metal complex, so as to deposit a mirror-like coating of aluminum on the surface of a substrate.
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申请公布号 |
US4923717(A) |
申请公布日期 |
1990.05.08 |
申请号 |
US19890325381 |
申请日期 |
1989.03.17 |
申请人 |
REGENTS OF THE UNIVERSITY OF MINNESOTA |
发明人 |
GLADFELTER, WAYNE L.;BOYD, DAVID C. |
分类号 |
C23C16/02;C23C16/14;C23C16/20 |
主分类号 |
C23C16/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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