发明名称 |
Homogeneous fine grained metal film on substrate and manufacturing method thereof |
摘要 |
A homogeneous fine grained metal film (6') on a substrate in accordance with the present invention comprises multiple metal layers and intervening layers (14) between the respective metal layers, the intervening layers being formed of a compound of the metal and a reactive gas and serving to suppress growth of grains (12') in the respective metal layers and to suppress electromigration of grain boundaries (13'). In a method for manufacturing a metal film (6') having homogeneous and fine grains on a substrate in accordance with the present invention, one or more intervening layers (14) are formed by introducing a gas reactive with the metal film one or more times during deposition of the metal film, whereby intervening layers of a metal compound are interposed between the successively deposited metal layers. Thus, a metal film of multilayered structure including multiple metal layers separated by the intervening layers is formed.
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申请公布号 |
US4923526(A) |
申请公布日期 |
1990.05.08 |
申请号 |
US19890300877 |
申请日期 |
1989.01.23 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
HARADA, HIROSHI;HIRATA, YOSHIHIRO;TOSA, MASANOBU |
分类号 |
C23C14/00;C23C14/02;C23C14/32;C23C16/02;C23C16/12;H01L21/768;H01L23/532 |
主分类号 |
C23C14/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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