| 摘要 |
A mask holder and a mask conveying and holding mechanism using the same, effectively usable in an exposure apparatus for printing a pattern of a mask or reticle on a workpiece such as a semiconductor wafer or a plate-like member made of glass or cermaics, is disclosed. In one preferred form, the mask holder has three positioning rollers, two spring-biased pressing rollers for pressing two side faces of a mask so that other two side faces of the mask abut against the positioning rollers, and two spring-biased pressing members for pressing an upper face of the mask so that a lower face of the mask abuts against a lower end face of a mask accommodating portion of the holder. With this arrangement, the mask can be held as a unit with the holder during conveyance. Also, the holder and a mask stage of the exposure apparatus may be arranged so that the mask can be held on the stage by vacuum suction.
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