发明名称 LIQUID TREATING DEVICE
摘要 PURPOSE:To easily discharge bubbles from a supply pipeline for a liq. resist, a liq. rinse, a liq. developer, etc., by opening and closing a valve mechanism provided to a defoaming pipeline by the operation of a switch. CONSTITUTION:A specified liq. is supplied to a substrate 24 to treat the substrate. In this case, the defoaming pipelines 12-14 are branched from the pipeline 5 for supplying the liq. at the specified positions. The valve mechanisms 18-20 which are opened and closed by the operation of the switches 18a-20a are provided to the defoaming pipelines 12-14. Bubbles are discharged from the pipeline 5 by the operation of the switches 18a-20a. As a result, the bubbles in the pipeline for supplying a liq. resist, a liq. rinse, a liq. developer, etc., can be easily removed, and the operability can be improved as compared with the conventional process.
申请公布号 JPH02119929(A) 申请公布日期 1990.05.08
申请号 JP19880272453 申请日期 1988.10.28
申请人 TOKYO ELECTRON LTD;TERU KYUSHU KK 发明人 HIRASAWA MASAKATSU;NAKAJIMA SATOSHI
分类号 G03F7/16;B01J4/00;B05C11/08;B05C11/10;G03F7/30;H01L21/027;H01L21/30 主分类号 G03F7/16
代理机构 代理人
主权项
地址