| 摘要 |
PURPOSE:To contrive the improvement of the etching accuracy for the titled film using hydrazine hydrate by a method wherein this film is heat-treated in vacuum before etching with a solution containing hydrazine hydrate. CONSTITUTION:A permalloy film 12 is prepared on a substrate 11, and an alumina film 13 is deposited thereon, thus forming a magnetic gap 14. Next, said resin film 15 is applied and heat-treated, and a coil 16 made of a metallic film containing Co as the main constituent is manufactured thereon. Then, said resin film 17 is applied again and heat-treated, and thereafter a negative photosensitive resin film is applied and dried. After exposure with ultraviolet light and then development, heat treatment is carried out. Using the solution containing hydrazine hydrate, the polyimide series resin film is selectively etchied. Finally, a permalloy film 18 is deposited again and patterned. In above processes, vacuum state is provided at the time of heat treatment of the films 15 and 17. Thereby, the decomposition of the resin film and the oxidation of copper can be prevented. Besides, the thickness of photosensitive resin can be smalled. |
