发明名称 SELF SUBSTRATE BIAS GENERATOR FORMED IN A WELL
摘要 A well is formed in a semiconductor substrate. The first capacitor is connected between the terminal to which the first clock signal is supplied and the first node. The second capacitor is connected between the terminal to which the second clock signal, which has an opposite phase to the first signal, is supplied and the second node. The first to fourth transistors are formed in the well. For the first transistor, a current path is connected between the substrate and the first node and its gate is connected to the first node. For the second transistor, a current path is connected between the substrate and the second node and its gate is connected to the second node.
申请公布号 KR900002911(B1) 申请公布日期 1990.05.03
申请号 KR19860007816 申请日期 1986.09.17
申请人 TOSHIBA CORP 发明人 OKADA YOSIO
分类号 H01L27/04;G05F3/20;H01L21/822;(IPC1-7):H01L27/04;H03K3/02 主分类号 H01L27/04
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