| 摘要 |
NEW MATERIAL:A compound shown by formula I (R1 is H or methyl; R2 is H or lower alkyl; m and n are 0 or 1, n is 0 when m is 1 and n is 1 when m is 0) or an amine salt thereof. EXAMPLE:A compound shown by formula II. USE:Useful as a rest preventive of metal, extreme-pressure additive, surfactant, raw material for synthetic resin, etc. PREPARATION:An aldehyde shown by formula III (n is 0 or positive integer) is reacted with hypophosphorous acid in the presence of benzotriazole shown by formula IV and a solvent, preferably toluene under normal pressure at 60-120 deg.C. |
