| 摘要 |
<p>PURPOSE:To continuously measure the thickness of a vapor-deposited film by providing a light-emitting and reflected light-receiving part and a transmitted light-receiving part above and below a substrate close to each other, amplifying the reflected light and transmitted light with an amplifier outside a vacuum deposition chamber and recording the amplified light. CONSTITUTION:A vapor-deposition source 23 of Te, Ge, ZnS, SiO2, etc., is placed in the vacuum deposition chamber 21, and a transparent substrate 22, such as an optical disk is rotated on the center of a rotating shaft 24 at a position opposite to the source 23. The vapor from the source 23 is deposited on the substrate 22 through the opening 25a of a mask 25 to form a vapor-deposited film 23a. The light-emitting and reflected light-receiving part 27 and the transmitted light-receiving part 28 are provided above and below the substrate 22 very close to each other during operation. The light emitted from the light emitting part 27 and then reflected by the substrate 22 on which a film is being deposited and the light transmitted through the substrate 22 are received respectively by the reflected light-receiving part 27 and the transmitted light-receiving part 28. The light signals are amplified by the amplifier for receiving light signal A, and then sent to a recorder B. The thickness of the film 23a is detected by the comparison of the intensities of the signals of the reflected light and transmitted light, a shutter 26 is closed when the thickness of the film 23a is increased to a specified value, and an optical disk substrate having constant reflectivity is produced.</p> |
