Highly sensitive positive photoresist compositions.

摘要

Positive resists sensitive to UV, electron beam, and x-ray radiation which are alkaline developable are formulated from a polymer material comprising recurrent structures having alkaline soluble groups pendent to the polymer backbone, a portion of which groups are substituted with acid labile groups. The attached drawing shows comparative spectral compositions of 1,4 mu m resist films of various compositions according to the present invention.