发明名称 TRIMMING OF MONOLITHIC INTEGRATED CIRCUIT
摘要 PURPOSE:To perform trimming in such a manner as to adjust elements to be trimmed in the increasing direction and decreasing direction as well by forming a double layer Al wiring after putting its Al wiring on top of Al wiring to be connected and connecting an overlap part between single and double Al wiring using a laser beam. CONSTITUTION:A double layer Al wiring layer 11, Al wiring 9, and Al wiring 10 are connected and respective resistance values are adjusted by cutting Al wiring 9 using a laser beam and by irradiating an overlap part between Al wiring 9 and a double layer Al wiring 11 as well as another overlap part between Al wiring 10 and the double layer Al wiring 11 using the laser beam. In this way, in the case where Al wiring 9 is cut, a relation among respective resistance values is expressed by means of the following equation: R=R1+R2+R3 and in the case where a double layer Al wiring 11, Al wiring 9, and Al wiring 10 are connected, a relation among respective resistance values is expressed by: R=R3 and further, in the case where a double layer Al wiring 11, Al wiring 9, and Al wiring 10 are connected; besides, Al wiring 9 is cut, a relation among respective resistance values is expressed by: R=R2+R3 where R1 is the resistance value of a resistance element 1 and R2 is its value of a resistance element 2 and then R3 is its value of a resistance element 3 and R is resistance value between Al wiring regions 6 and 7.
申请公布号 JPH02117168(A) 申请公布日期 1990.05.01
申请号 JP19880271326 申请日期 1988.10.26
申请人 MITSUBISHI ELECTRIC CORP 发明人 MURAO FUMIHIDE
分类号 H01L27/04;H01L21/82;H01L21/822;H01L27/08 主分类号 H01L27/04
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