| 摘要 |
A CMOS device having an nMOS formed in a p-type substrate region, and a pMOS formed in an n-type substrate region is provided with a Schottky barrier junction for collecting holes injected into the n-type substrate region, to prevent latch-up. The Schottky barrier junction is formed by a metal electrode and the n-type substrate region, and is located between the pMOS and the nMOS.
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