| 摘要 |
<p>PURPOSE:To protect a silicon wafer from damage by a method wherein, when the wafer is attracted by the rear of the attracting hand of an automatic conveyer, the wafer is attracted from the position apart from the wafer placed in a boat with a predetermined distance and, if the wafer is inclined, the wafer is again attracted from a higher position whose distance from the wafer is extended. CONSTITUTION:When a wafer placed in a boat is taken out and conveyed, at first an attracting hand 5 placed at an initial position is transferred to a reference position which is apart from the wafer 15 with a distance (h) and a solenoid valve 22 is opened and the air is sucked by the suction holes 11 of the hand to start the attracting operation. Then a motor 9 for a vertical movement is rotated to make a horizontal transfer part 2 descend and the hand 5 is made to descend with a distance (h) and the motor 9 is rotated to the opposite direction to return the hand 5 to the reference position. At that time, if the wafer 5 is in a proper state and placed in the trench 17 of a boat, a carriage 3 is transferred. On the other hand, if the wafer 5 is inclined, it is detected by a pressure sensor 12 and a minute distance is added to the distance (h) to predetermine the new distance and the operation is repeated form the beginning to correct the posture of the wafer 15 to a horizontal state.</p> |
