| 摘要 |
PURPOSE:To stably form resist patterns of a hole type which are fine and have sheer wall surfaces by coating the surface of a substrate with an org. high-polymer material to the thickness to cover the circuit patterns of the pole type, then uniformly removing the org. high-polymer material until the circuit patterns are exposed. CONSTITUTION:The pole type circuit patterns 1 are formed of a positive type photoresist on the substrate 2. The surface of the substrate 2 is then coated with the photoresist 3 consisting of the org. high-polymer material to the thickness to cover the circuit patterns 1. The photoresist 3 is removed uniformly from the surface until the circuit patterns 1 are exposed. The patterns are formed by using the photoresist 3 consisting of the org. high-polymer material on the substrate 2 if the exposed circuit patterns 1 are selectively removed. A suitable photoresist, such as cyclic rubber, is selected as the org. high-polymer material, by which the tough patterns having the high heat resistance and the sheer wall surfaces are formed. |
