| 摘要 |
PURPOSE:To enhance storage stability of the solution of the material to be used for the photodecolorable layer and to enable simultaneous development with a resist layer by using a specified dye and rosins. CONSTITUTION:The title material contains one or more kinds of pyridyl- pyridylethylene derivative dyes represented by formulae I-III absorbing light in the wavelength region of 280-370nm and soluble in a weakly polar organic solvent, and the rosins. In formulae I-III, each of R1 and R2 is H, alkyl, or the like and each of X1-X8 is cyano or amino or the like. A pattern is formed by successively laminating the resist layer and the photodecolorable layer made of the material on an undercoat layer formed on a substrate by coating, exposing it to light, such as ray i (365nm), and simultaneously developing them by using an aqueous alkaline solution in the case of a positive type resist, or by using an organic solvent in the case of a negative type resist. |
