发明名称 PHOTOMASK
摘要 PURPOSE:To eliminate projections near the black matrix of color filters by providing quasi-light shielding parts which can change a resist from complete exposing to unexposing to the boundary parts between light transparent parts and the light shielding parts. CONSTITUTION:This mask is provided with the light transparent parts 4 which completely expose the resist 3, the light shielding parts 5 which do not expose the resist, and the quasi-light shielding parts 7 which can change the resist from the complete exposing to the unexposing are provided on one surface of transparent glass 6 of this mask. The regions 5, 7 are preferably constituted of the film contg. a photosensitive resin consisting of a multifunctional acrylate monomer, org. polymer binder and photopolymn. initiator and trihalomethyl-s- triazine compd., and a pigment. The film loss of the region 7 decreases if this mask is used and, therefore, the flat picture elements having no projections on the black matrix 2 and near the same are formed.
申请公布号 JPH02115841(A) 申请公布日期 1990.04.27
申请号 JP19880269896 申请日期 1988.10.26
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 INAMI TAKASHI;ASO SHINICHI;TAKEGAWA HIROZO;AKUTAGAWA RYUTARO;SHIMIZU TOKIHIKO
分类号 G02B5/20;G03F1/68;G03F1/80 主分类号 G02B5/20
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