| 摘要 |
PURPOSE:To enhance the sensitivity of a positive type resist material by adding a plasticizer to the above-mentioned material. CONSTITUTION:The plasticizer is added to the positive type resist material (e.g.; polymethyl methacrylate) and such material is used at the time of forming the thin film of the above-mentioned material on a substrate, irradiating the thin film with radiations and developing the resist to form patterns. One or more kinds of ditridecyl phthalate, diisodecyl phthalate, di-2-ethyl hexyl adipate, diisodecyl adipate, di-2-ethyl hexyl sebacate, and trisdichlorpropyl phosphate are preferably used as the plasticizer. |
