首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
INK JET HEAD
摘要
申请公布号
JPH02112949(A)
申请公布日期
1990.04.25
申请号
JP19880265296
申请日期
1988.10.21
申请人
SEIKO EPSON CORP
发明人
KITAHARA TSUYOSHI;MIYAZAWA YOSHINORI;NAKAMURA OSAMU
分类号
B41J2/045;B41J2/015;B41J2/055
主分类号
B41J2/045
代理机构
代理人
主权项
地址
您可能感兴趣的专利
DEVICE FOR LACERATION OR INCISION CLOSURE
METHOD FOR PRODUCTION OF AN OPTICAL COMPONENT FROM QUARTZ GLASS
METHOD FOR PRODUCTION OF AN OPTICAL COMPONENT MADE FROM QUARTZ GLASS AND HOLLOW CYLINDER MADE FROM QUARTZ GLASS FOR CARRYING OUT SAID METHOD
Apparatus for examining properties of objects
Flip chip light emitting diode devices having thinned or removed substrates
GATE ELECTRODE FOR MOS TRANSISTORS
Light-transmitting module containing an driving device in a package
POLYURETHANE ARTICLES, COLORANTS, AND SUCH ARTICLES COMPRISING NOVEL HIGH TOLUENE DIISOCYANATE-STABLE BLUE COLORANTS
SYSTEM AND METHOD FOR OUTCOME-BASED MANAGEMENT OF MEDICAL SCIENCE LIAISONS
METHODS AND APPARATUS FOR FACILITATING CREATION AND USE OF A SURVEY
FUEL INJECTOR INCLUDING A COMPOUND ANGLE ORIFICE DISC
SOCKET, AND TESTING DEVICE
RADIO RECEIVER AND AUTOMATIC GAIN CONTROL METHOD
Endovascular implant for the injection of an active substance into the media of a blood vessel
Glass substrate for display and manufacturing method thereof
Semiconductor device fabrication method
Method for fabricating semiconductor device, and electro-optical device, integrated circuit and electronic apparatus including the semiconductor device
Exposure mask and mask pattern production method
Image printing order receiving sysem and image printing order receiving method
Method for inspecting a defect in a photomask, method for manufacturing a semiconductor device and method for producing a photomask
