发明名称 Apparatus for processing an object by gas plasma with a reduced damage
摘要 For processing an object by the use of gas plasma generated in a predetermined gas, such as nitrogen, in cooperation of an electromagnetic wave with a static, an alternating, and a rotating magnetic field, an apparatus comprises a magnet around a first part of a reaction vessel to produce the magnetic field substantially parallel to an interface at which the first part is contiguous with a second part of the reaction vessel so as to confine the gas plasma within the first part. The interface may be open ultraviolet rays and charged or neutral particles produced by the gas plasma. Alternatively, an optical window may be disposed at the interface to use only the ultraviolet rays with the object held within the second part.
申请公布号 US4919783(A) 申请公布日期 1990.04.24
申请号 US19870128775 申请日期 1987.12.04
申请人 ANELVA CORPORATION 发明人 ASAMAKI, TATSUO;MITO, HIDEO;NAKAGAWA, YUKITO;SEKIGUCHI, ATSUSHI
分类号 H01L21/302;H01J37/32;H01L21/205;H01L21/263;H01L21/3065;H01L21/31 主分类号 H01L21/302
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