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发明名称
DOUBLE LAYER PHOTO RESIST TECHNIQUE FOR SIDE-WALL PROFILE CONTROL IN PLASMA ETCHING
摘要
申请公布号
KR1019900002688(B1)
申请公布日期
1990.04.23
申请号
KR1019860700936
申请日期
1986.12.27
申请人
发明人
分类号
主分类号
代理机构
代理人
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